MOSIS had copies of a NIST Report on CMOS MEMS.  The report contained
saftey and handeling instructions and a diagram of the etching apparatus.
I thought that the report was also on-line at MOSIS but I could not find
it in their new web site.  Or, contact Janet Marshall
(marshall@piper.eeel.nist.gov) to be sent a copy.

Regards,

Michael Gaitan

On Thu, 6 Aug 1998, N K Choudhary (97307404) wrote:

> Hello,
>       We need to etch( anisotropic ) Si using Ethylene Diamine + Pyrocathechol
> We have procured the chemicals in sealed bottles WITHOUT the saftey /
> handling instructions. I would appreciate if somebody could help us
> either by giving a reference or the instructions themselves.
>       The crunch is heating the mixture to 80 deg C using a reflux system.
>
> Regards
> NK Choudhary
>
>
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