See: K. van Schuylenbergh Xerox Palo Alto Research Center StressedMetal™ Technology and Its Record Breaking On-Chip Microcoil Chua, C. L.; Fork, D. K.; Van Schuylenbergh, K.; Lu, J. P. Out-of-plane high Q inductors on low resistance silicon. Journal of Microelectromechanical Systems. 2003 December; 12 (6): 989-995. Chua, C. L.; Fork, D. K.; Van Schuylenbergh, K.; Lu, J. P. High-Q RF coils on silicon integrated circuits. MEMS Components and Applications for Industry, Automobiles, Aerospace and Communication II; 2003 January 28-29; San Jose, CA. Bellingham, WA: SPIE; 2003; 4981: 150-155. 2. ieeexplore.ieee.org/iel5/10171/32491/01516706.pdf 3. Design of toroidal inductors using stressed metal technology Jeong-Il Kim Dae-Hee Weon Jong-Hyeok Jeon Mohammadi, S. Katehi, L.P.B. Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA; This paper appears in: Microwave Symposium Digest, 2005 IEEE MTT-S International Publication Date: 12-17 June 2005 ---------------------- Refs from: Bill Flounders Berkeley Microlab Nodes Norbert wrote: > Professor Xinxin Li at Shanghai Institute of Microsystems and Information Technology (SIMIT) did some work on creating micro inductors by MEMS technology. Unfortunately, I do not know where it has been published.