Only oxidizes in oxygen plasma - no etch.
Copper does not lend itself to plasma etch with Cl or F
gases either due to the low volatility of copper chloride
or copper bromide products.
There was an interesting dry/wet combined etch
developed at Texas A&M in which copper halide product is
formed via halide gas plasma treatment and then the non-volatile
product is dissolved in a wet bath
Y. Kuo, S. Lee / Vacuum 74 (2004) 473–477

Bill Flounders
Berkeley Microlab

Hakemi, Ghazal wrote:
> Dear all,
>
> I have a chemistry-related question : does copper etch away in oxygen plasma?
>