Hello, everyone Recently I found out that conducting photo lithography procedure on small samples is quite challenging. For example, we have MA/BA 6 Mask and Bond Aligner in our lab to expose samples with photoresist on them. However, exposing small samples brings great challenge. I usually put the small samples on top of a dummy wafer and expose. Sometimes after finishing exposure the small samples are stuck to the mask when the wafer holder goes down if the thickness of the samples is thicker, which also brings damage to the expensive mask. I wonder if anyone has some good ideas about this tricky problem. I will really appreciate some good ideas. Alim Polat, PhD student Linkoping University Sweden