Hi Darren,

Negative photoresists are alkali-resitant to a certain extent. But you`ll need
higher curing temperatures than 80°C, especially if you want to minimize
outgasing.

Regards,

Natsuki

-----Ursprüngliche Nachricht-----
Von: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] Im
Auftrag von Slade, Darren (SELEX GALILEO, UK)
Gesendet: Freitag, 14. März 2008 09:14
An: mems-talk@memsnet.org
Betreff: [mems-talk] NaOH Resistant Sealant

Hi All,

I am looking for a something in the way of a sealant to protect Al bond
pads on a silicon wafer from being attacked in NaOH/H2O2 etch.
The sealant should be low/non-outgassing, low (<80degC) cure temp, low
viscosity and easily and completely removable with domestic chemicals
(acetone, tetrachloroethylene etc).

I'll be grateful for any recommendations, even if they don't meet all
the specs above. I am currently using Dow Corning DC282, but it is not
wholly resistant to the NaOH.