Bhargav, I can't answer most of your questions but here is what I do. I use an e-gun evaporator and start with Ti3O5. After a good melt, I evaporate at 3 angstroms a second. I have an O2 over pressure of 2E-4 and have the substrate above 250c. I can dry etch it in Ar/Sf6/O2 but it is slow and sometimes needs a 5 second BHF dip to clean completely. I believe the refractive index was 2.2. I hope you can build on this. Brent Bhargav Nabar wrote: > *TiO2 thin film mechanical properties, deposition, dry etching.* > > Hello everyone, > > Titanium dioxide (TiO2) thin film mechanical properties : I need to deposit > a thin amorphous film of Titanium dioxide TiO2 about 100 - 200 nm thick. If > anyone has any information on the mechanical properties of thin film TiO2 > such as tensile strength, Young's modulus, Bulk modulus, Fatigue, Poisson's > ratio, force -displacement results or pressure -displacement results please > help. > > Titanium Dioxide (TiO2) deposition : What is the best way to deposit a thin > film of TiO2 so as to have a very low surface energy? > > Titanium Dioxide (TiO2) Etching: What is the best dry etch chemistry for > TIO2? Can TiO2 be etched in Ar/Sf6 plasma at 80-90 mtorr?