Dear MEMS researchers, I am currently working on a polysilicon thermocouple(3000A thickness), and would like to ask some questions regarding the fabrication process. I would like to know about the input energy of boron and resistivity of polysilicon when doped with different dosage and temperature conditions. Also I wonder about the relationship between annealing temperature and time. If you have any procedures in fabricating thermocouple using polysilicon, I would be grateful if you can share them with me. Sincerely yours BongSeop Kwak Yonsei University