Thanks. Actually I have already tried the method used in the APL paper (scratch the surface, sonication,etc). But it just doesn't work. Maybe I will try to use NanoStrip to remove PMMA layer. Best regards, Jun On Fri, Aug 29, 2008 at 1:01 PM, Roger Shilewrote: > Atomic Layer Deposition is conformal deposition process. I would, > therefore, have expected some difficulty doing liftoff. > However Google search for "ald liftoff" returned the following which you > might find helpful, > > Low-temperature atomic-layer-deposition lift-off method for > microelectronic > and nanoelectronic applications > APPLIED PHYSICS LETTERS VOLUME 83, NUMBER 12 22 SEPTEMBER 2003, p.2405 > > Roger Shile