I recently had OK results depositing a film of 2-3 microns SiO2 using
an e-beam evaporator.  The stoichiometry probably isn't exactly right,
and this was backed up by the fact that the dielectric strength didn't
seem as good as it should be (probably too much pure Si).  I haven't
tried a layer as thick as 20-30 microns.  What is your application?

On Fri, Nov 21, 2008 at 3:54 AM,   wrote:
> hi
>   Does anyone know how can i either deposite or grow thick layer of SiO2
> about 30 micron ??
> --
> Kamlesh Pawar