Now, I'm no expert on EBL, but as far as I can see, the two first steps should be reversed. If you want a gold pattern on the substrate, you need to sputter gold on first, then spin coat the resist. Otherwise the gold etchant will simply etch away all the gold (is 6 seconds enough?). // Morten li shifeng wrote: > Hi, guy > > I'm trying to write some patterns on glass substrate. Here is my process: > > Spin coat 500nm PMMA 950 C4, > Sputtering 5nm gold > EBL exposure > Strip gold using TFA gold etcant for 6 second > Develop in MIBK : IPA= 1:3 for 30 sec > > The problem is I cannot find any pattern on the substrate afterwards. What are the possible reasons for that? Anyone have similar experiences on this or has a working recipe to share?