Dear Evelyn,

For descum of S1813;  300 W, 300 mT, 30 secs works well.
The lower powers should also work if you increase the duration.  You can
also try 150 W, 300 mT, 1 min.

For ashing of S1813; you may increase the power level to 500 W if
possible. You can increase the pressure to 600 mT.  The duration may
change according to the thickness of the photoresist, but 30 minutes
will be OK if you apply 300 W.

Good luck,
Regards,

Kagan TOPALLI, Ph. D.
Senior Research Engineer
METU-MEMS Center
Middle East Technical University
TR-06531 Ankara Turkey
Phone: +90 312 210 44 09 or +90 312 210 23 40
Fax: +90 312 210 23 04
http://www.mems.eee.metu.edu.tr/~topalli/


Evelyn B wrote:
> I would like to know how to develop recipes for descum and ashing of 3000PY
> and 1813 resists on Alumina and MgO substrates using any type of equipment.
> I know both processes are used for residue cleaning but I would like to know
> how to develop the recipe myself.  In other words, how to select the power
> level (W), Volumetric Flow Rate (sccm), duration (minutes), pressure (mT),
> etc. as applicable to a system.
>
> Thanks,
> EVELYN BENABE