Hello all,

I'm trying to etch square holes of dimensions ranging from 10um by 10 um
to 64um by 64um in Silicon dioxide. The problem is I wish to etch 10um
deep and my photoresist, AZ4562 has a poor selectivity for the various
fluorine base gases I have tried thus far (CHF4, CHF/O2/Ar, SF6).

I've been doing some reading and metal masks seem to be the solution.
Has anyone ever done any deep silicon dioxide etching? If so any
hints/tips/advice would be much appreciated.

Thanks!

--
Dr. James Paul Grant
Postdoctoral Research Associate
Microsystems Technology Group
76 Oakfield Avenue Room 3
University of Glasgow
Glasgow
Scotland
G12 8LS

Telephone: +44(0)141 330 3374