You can deposit films by UV photopolymerization at very low temperatures --reported down to -10C back in the mid 70s. -CHM On Wed, 9 Sep 1998, lee ki seong wrote: > > hello, colleague > It might be silly question to somebody. > > but I think it's impossible. > > Is there anybody who try to deposit some film at very low temperature. > > In PECVD plasma usually occur a little high temp because mobility of > electrons are better as temperature higher. > > I think it'll possible ,if there is something to break the eletron orbit > from nuclear. > > If there is anybody to make a new process , would you join me and > make revolution. > > with thanks. > >