Hi, I have been doing a little bit of literature research about deposition of BST-5 films on MgO substrates and have found that most the films are deposited using Pulsed Laser Deposition (PLD) systems instead of RF Sputtering. I was under the understanding that RF sputtering was superior than PLD because it provides smoother surfaces, better uniformity, higher breakdown voltage, and lower losses. Why is PLD then chosen as the deposition method for MgO substrates? Evelyn -- EVELYN BENABE Graduate Research Assistant RF Microsystems Research Group University of South Florida 4202 East Fowler Avenue Tampa, FL 33620 Office: ENB 412 Office Phone: (813)-974-4851 Email: benabe@mail.usf.edu