Acetone will strip photoresist. I'm surprised you can pattern it without a
bake.

Robert

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of li xuan
Sent: Thursday, June 11, 2009 3:19 PM
To: General MEMS discussion
Subject: [mems-talk] Photoresistor remover

Hi,

I am using the shipley 1805 to coat my plate to make hologram. My process is


1. coat the glass with 1805, then let it air dry for about 4 days.
2. make some hologram on it.
3. silver spray
4. put into electroforming tank grow to a thick shim.
5. seperate the shim from the glass. used NaOH 5% to remove the
photoresistor from the silver layer.

Now the problem I got is when I put the silver shim back into tank to make a
copy. the copy is always got stick and lots of water strip. People think it
is because the photoresistor is not compeletly removed from the silver layer
or maybe the silver layer gets destroyed by NaOH. Does anyone have any idea
why this happens? Do I really have to bake the photoresistor to make it easy
to remove? Can anyone recommend some remover? I try the shipley 1112A. seems
does not work at all. Thanks!


Paddy