Hi,

First, you must ensure that your deposition chamber is as clean as
possible, in our lab, the chamber is cleaned before each deposition
using a vacuum cleaner (to remove dust and metallic contaminant) and in
case of very dirty chamber you can clean it with IPA.

Secondly, to clean your glass wafer you can use acetone and ultrasonic
bath, followed by IPA and DI water rinsing. It may help and it is not
aggressive for aluminium.

Alex

Nicolas Vergauwe a écrit :
> Hi everyone,
>
> During the processing of glass wafers with a layer of aluminum, I saw the
presence of dust and
> other contaminants on the wafer. Up to now, I don't do any kind of cleaning
after I sputtered
> the aluminum on the glass wafer because I'm afraid this will affect the
aluminum layer.
>
> Can you recommend me a cleaning method which removes the contaminations
without
> harming the aluminum layer? Or are there other tricks to avoid contamination?
>
> Regards,
> Nicolas


--
Dr. Alexandre BOE
Post-doctoral researcher
Université Catholique de Louvain
FSA/ELEC/EMIC - Laboratoire d'hyperfréquences
Bâtiment Maxwell b.207
Place du Levant, 3
B-1348 Louvain-la-Neuve
Belgium

alexandre.boe@uclouvain.be
Tel.  +32 10 478 106
Fax   +32 10 478 705