Dear all,

I am trying to cast PDMS on a Si wafer, creating a sheet of PDMS about 0.8 -
1 mm thick. I have a really hard time removing the PDMS from the Si wafer. I
understand that you guys coat the wafer with
Tridecafluoro-1.1.2.2-Tetrahydrooctyl Tichlorosilane to make the peeling
process easier. What I want to know is how well it works and how much to
apply? Also, are there any chemicals that would make it easier to peel PDMS
from the wafer?

Thank you so much for your help!

Jimmy