hi wang,

The Tridecafluoro-1.1.2.2-Tetrahydrooctyl Tichlorosilane works pretty well,
and you need just two or three drops for each wafer. Put your wafer in a
vacuum desiccator, put a paper under your wafer, and drop two or three drops
of silane on the paper. Turn on the vacuum for 4 min and keep the vacuum at
least 1 h. After that, pour the PDMS on the wafer. after removing the air
bubbles, bake it in a oven. Cut the PDMS from the edge of the wafer, it can
be easily peeled off.

hope it may helpful.


2009/7/18 Jimmy Wang 

> Dear all,
>
> I am trying to cast PDMS on a Si wafer, creating a sheet of PDMS about 0.8
> -
> 1 mm thick. I have a really hard time removing the PDMS from the Si wafer..
> I
> understand that you guys coat the wafer with
> Tridecafluoro-1.1.2.2-Tetrahydrooctyl Tichlorosilane to make the peeling
> process easier. What I want to know is how well it works and how much to
> apply? Also, are there any chemicals that would make it easier to peel PDMS
> from the wafer?
>
> Thank you so much for your help!
>
> Jimmy

--
赵亮
南京大学化学化工学院
Liang Zhao
School of Chemistry and Chemical Engineering, Nanjing University