Andrea,

What is your substrate? Also, what process steps where you performing?

Best
shay

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Andrea Mazzolari
Sent: Saturday, July 18, 2009 10:48 PM
To: General MEMS discussion
Subject: [mems-talk] improve photoresist adhesion

Hi All,

I need to deposit a photoresist of thickness about 5um, and pattern it in
order to relize structures of lateral sizes 4x1000um. I tried using AZ9260
photoresist, but i had adhesion problems after development step.
I used HMDS as adhesion promoter.

I also tried to use a O2 plasma before photoresist spinning, but it did not
helped.

Any suggestions to improve photoresist adhesion ?

Best regards,
Andrea