Hello folks, I'm trying to do Si deep RIE with AZ9260 photoresist as a mask in a PlasmaTherm etcher. Any good recipe for AZ9260 PR? The recipe I used was as follows. 1. AZ9260 spun at 2000 rpm for 60s (~11um) 2. 110C 5 min softbake 3. 540mJ/cm2 exposure 4. AZ 421K developer ~3min 5. No hardbake. The smallest feature size is 20 un wide lines. The mask would barely hold up to 200 cycles of etching. Thanks TK