Dear all,

I want to improve adhesion amorphous Si film deposited by PECVD on the
soda lime glass substrate.
Now I wash the substrate by fuming HNO3 before CVD, but some of a-Si
film is peeled off.

So I'm going to try following approaches to improve adhesion,
(1)Washing substrate by H2SO4-H2O2
(2)Depositing Cr or Ti layer before a-Si CVD
(3)Anodically bonding interface of a-Si film and substrate after CVD
(not wafer to wafer bonding)

In case of (2), I'm afraid of oxidation of Cr or Ti when carrying
substrate from sputtering facility to CVD.
In (3), there is no paper or report to improve adhesion with this approach.

If some of you have tried above approaches, will you tell me if it can
go well or not?

And does anybody know other approaches?

thanks,
Ryu