Hi Ryu,

  Have you tried deposited very thin PECVD USG on your substrate before aSi
deposition?

 I know adhesion between aSi and USG is good.

Good Luck.

Pin


>
> ---------- Forwarded message ----------
> From: nz_overlander@yahoo.co.jp
> To: mems-talk@memsnet.org
> Date: Thu, 26 Nov 2009 21:39:59 +0900
> Subject: [mems-talk] How to improve adhesion between aSi (by PECVD) on
> glass
> Dear all,
>
> I want to improve adhesion amorphous Si film deposited by PECVD on the
> soda lime glass substrate.
> Now I wash the substrate by fuming HNO3 before CVD, but some of a-Si
> film is peeled off.
>
> So I'm going to try following approaches to improve adhesion,
> (1)Washing substrate by H2SO4-H2O2
> (2)Depositing Cr or Ti layer before a-Si CVD
> (3)Anodically bonding interface of a-Si film and substrate after CVD
> (not wafer to wafer bonding)
>
> In case of (2), I'm afraid of oxidation of Cr or Ti when carrying
> substrate from sputtering facility to CVD.
> In (3), there is no paper or report to improve adhesion with this approach.
>
> If some of you have tried above approaches, will you tell me if it can
> go well or not?
>
> And does anybody know other approaches?
>
> thanks,
> Ryu