Andy, If you have access to any simple lapping equipment, you should be able to get a roughened surface in a minute or less. The wafer can be mounted onto a substrate, such as a glass disk, using a wax or other temporary adhesive. Mix a slurry out of Al2O3 grit, maybe about 3µm, with a 1:3 to 1:5 ratio ( v/v grit:water) and put it into a squeeze bottle. It won't dissolve, but keep it suspended by shaking it. Put some grit onto a flat glass plate and lap the wafer using a figure eight motion for about a minute, you should be fine. Often, wafers are thinned after processing using a similar process. I once had a process where I had to thin my GaAs wafer and then repolish it. Your task is simple by comparison! Brad Cantos brad.cantos@holage.com http://holage.com On Jan 20, 2010, at 1:38 AM, Andy Irvine wrote: > Hi all. > > Apologies for joining in order to ask a question - very bad form. I promise to answer at least one myself! Anyway... > > Any good tips for roughening a GaAs surface? > > I'm working with a GaAs(-based) wafer with (curses!) a polished back face, and am trying to avoid the possibility of multiple optical reflections between the two faces of the wafer. I therefore need my back surface to be rough (in fact, just like any old one-side-polished substrate!). I'd guess that it's going to involve mechanical abrasion followed by a preferential etch, but if anyone can be more specific and save me time (and ideally give me a good chemical-only HF- free method, please Santa), that'd be extremely helpful. > > I've blackened many a surface in my time, but it's remarkably hard to do it when you actually want to... ;-) > > Cheers, > > Andy