Hi all,

Does anyone have any experience of electroplating PR on conductive surface?
The idea is to cover the conductive surface with some kind of PR and then
etch the other Si areas in DRIE. The normal mask for DRIE is SiO2 or silicon
nitride. But I cannot just cover the metal region without covering the Si. So
I'm thinking using some kind of electroplatable PR. I found this PR called
INTERVIA™ 3D-P PHOTORESIST.  Has anyone used it before?

I really appreciate if anyone could provide any suggestion on this process.

Thanks,
Lin