Hello all,

I'm having some problems with PR stripping off from the Si chip.
Because I have a small structure that when I put in ultrasonic bath with
acetone, an entire device lifted off.

Thus, I have changed to O2 plasma for 5min (1 Torr and 200 W) and acetone
bath for 10 min. But I am not sure it strips off PR clearly.

Does anyone have any ideas?

--
Great day,
-- Jiho Song