Hi,

I think both are OK.

In my experience, keep the photoresist in its original bottle is the best
way for SU-8. And just pour it on your Si wafer when you do spin coating. It
may need more SU8 than you expect to cover the wafer, but it is the best
way. Just keep it in your dark room, not necessary to keep it in fridge.

good luck.


2010/1/30 Sheng Zhang 

> Hi, all,
>
> I need to decide which SU-8 to purchase, 2075 or 2100. I will use SU-8 to
> build a 150um~200um structure.
>
> The datasheets suggests both of them can achieve ~ 200um thickness. The
> difference is spin speed - higher for 2010 because of its higher viscosity.
>
> I think using higher spin speed would result in better thickness
> uniformity,
> but I'm afraid with relative higher viscosity 2010 might be harder to
> handle
> (especially when dropping/pouring out of bottle)...
>
> Another question: where do you keep the resist? Get some in a small bottle
> or just keep them in the original bottle?
>
> And under what temperature? My cleanroom keeps all the photoresist in a
> fridge..I think that would make 2075/2010 even harder to handle when they
> are cold...
>
> Any suggestion?
>
> Thanks!
> Sheng

--
赵亮
南京大学化学化工学院
Liang Zhao
School of Chemistry and Chemical Engineering, Nanjing University