Hi all; Now i am making silicon rib waveguide using dry etcing . To decrease the sidewall roughness as much as possible i plan to use Room T continuous process instead of Bosch process. Anybody can give some suggstion to increase the etch rate ? My process parameter:SF6:C4F8:O2 sccm:5sccm:80sccm,power=800w,time=120s,pressure=10mT,RF power=10w Andrew Phoneï¼13764619431