You might try 600 Angstroms of chrome followed by 3000 Angstroms of sputtered gold. Cover this with 2000 Angstroms of PECVD Si3N4, which could be used as a mask to etch the underlying metals and provide an additional barrier to the etching. -----Original Message----- From: Julian ShapleyTo: MEMS@ISI.EDU Date: Friday, November 06, 1998 11:37 PM Subject: HF resist >Hello Mems Workers > >Could anybody give me any leads on a substance that could be used as a >masking material for HF for a long period of time. > >Thanks in advance > >Julian Shapley >University of Cardiff. >UK > >______________________________________________________ >Get Your Private, Free Email at http://www.hotmail.com >