YES HMDS can help. HMDS reacts with hydrogen and or water. If you truly dehydrate vacuum and heat is best and can protect the wafer from seeing moisture laden atmosphere you can get perfect adhesion. HMDS is NH-(Si(CH3)3)2. The NH reacts with the H on the wafer and produces NH3, ammonia and leaves behind Si(CH3)3. An inorganic/organic molecule, perfect for an organic/inorganic bridge. If the HMDS reacts with an hydroxyl ion it sticks forever. If it reacts with a loose water molecule you get the same outside effect that looks good but it can release with harsh processing causing rough edges and poor adhesion. Bill Moffat -----Original Message----- From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of hui yan Sent: Monday, January 24, 2011 9:56 PM To: mems-talk@memsnet.org Subject: [mems-talk] AZP4620 peels off i m using positive photoresist AZP4620 for photolithography. However, during the development step, the resist layer peels off when washed with DI water; though i have tried numerous times and have shorten the development time to 20s. I have cleaned my wafer using piranha solution, followed by DI water rinse, then rinsing with acetone, IPA, DI water. And then dehydrate my wafer at 120 C for 30 min. Does HMDS primer helps? if so, what is the recipe for spin coating it? Regards, Hui Yan Mechanical Engineering National University of Singapore