The Microchem people advise against using acetone, the LOR precipitates in its
presence. The recommended solvent is Remover PG for LOR's. Good luck.

Thomas

-----Original Message-----
From: mems-talk-bounces+wilsont=marshall.edu@memsnet.org [mailto:mems-talk-
bounces+wilsont=marshall.edu@memsnet.org] On Behalf Of Michael Martin
Sent: Wednesday, October 05, 2011 4:17 PM
To: sumit kalsi; General MEMS discussion
Subject: Re: [mems-talk] LOR resist not releasing SU 8

Hi Sumit,

   What solvent are you using to release the LOR?  My understanding is that the
longer and higher the temperature one uses to bake LOR the harder it is to
solvate.  We have had good luck removing LOR with MF-319 but less so with
acetone.

Cheers,
  Michael

On Wed, Oct 5, 2011 at 8:58 AM, sumit kalsi  wrote:

>
> Dear All,
>
> I am trying to use LOR 5A for release of SU 8 sheets. It worked fine
> with single patterning of SU8. Recently I tried to use it for
> releasing SU 8 which is double patterned, but it did not released SU
> 8. Could it be that because of two post bakes that it is not releasing
> SU 8? I pattern SU 8 (around 50um) and then after 3-4 hours (because
> of overnight exposure with a laser), post bake it according to
> specifications given by microchem. Then I expose it again and post bake
immediately. Develop it after atleast 4 hours.
> Has any one had any experience on this? Any help is much appreciated.
>
> Thanks a lot in advace!
>
> Kind Regards,
> Sumit