Hi
yes you can depending on the etch gas.
I used Aluminum (DC sputtering) as RIE etch stop for silicon oxide
(pecvd), it should work for silicon nitride as well, and use CF4 etch
recipe.
avoid titanium or TiW if using CF4.
avoid using SF6 + oxygen with aluminum

===================================
Salam R. Gabran, MASc.
Research associate, PhD. Candidate
Center for Integrated RF Engineering
(CIRFE Lab)
ECE Dept., University of Waterloo,
200 University Avenue West
Waterloo, Ontario, N2L3G1


On 3/6/2012 12:51 PM, mems-talk-request@memsnet.org wrote:
> Metal Etch Stop (Kipp Schoenwald)
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

Want to advertise to this community?  See http://www.memsnet.org

To unsubscribe:
http://mail.mems-exchange.org/mailman/listinfo/mems-talk