Dear all, I'm using SU-8 2005. I soft bake at 65C_540S, exposure dose is 60mJ and post exposure bake at 95C-120S. Recently I encounter a problem where, after undergone gold plating process, photoresist residue remains. My stripping(remover PG) process is at 65C for an hour followed by acetone bath in ultrasonic. My plating temperature is about 45C for 25minutes. I tried to strip in remover PG for another 30minutes but nothing seemed to be working. I had tried using the same condition previously and did not encounter this problem. I need some advice or comments on this. Thanks a lot in advance. Best Regards, Jocelyn _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk