Hi Yuan,
It should work the way you want to do it.

Instead of Cr hard mask, you can also use a thick (5 or 10 micron should be
enough) resist if your process allows.

Good luck!

Regards,

Mehmet
On Sep 11, 2015 18:21, "Yuan Jia"  wrote:

> Hi All
>
> I have a quick question, I am trying to etch through 300 nm of silicon
> nitride using SF6 dry etch, and I am considering using 50 nm of chrome as
> mask layer, will this mask layer survive the etching?
>
> Or is there a better mask layer material?
>
> Thanks very much
> Best Regrads
>
> --
> Yuan Jia
>
> Mechanical Engineering Department
> Columbia University
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