durusmail: mems-talk: DRIE
DRIE
2001-09-04
DRIE
Sonbol Massoud-Ansari
2001-09-04
Dear Dr. Berney,

We provide DRIE of 4" silicon wafers at ISSYS.  Please feel free to contact
me and I'd be happy to discuss your process requirements.

Best Regards,

Sonbol Ansari

--

*******************************
Sonbol Massoud-Ansari
Director of External Services
Integrated Sensing Systems, Inc.
387 Airport Industrial Drive
Ypsilanti, MI 48198
Tel : (734) 547-9896 ext. 104
Fax : (734) 547-9964
Email : sonbol@mems-issys.com
WWW : http://www.mems-issys.com
*******************************


Helen Berney wrote:

> Hi all,
>
> I am looking for a foundry that can perform deep reactive ion etching
> (375 micron etch in 525 or 750 micron silicon wafers).  Ideally I am
> looking for somewhere that can process four inch wafers.  Depending on
> clean room constraints, I can supply patterned nitride on silicon wafers
> for further processing or discuss our full process requirements with the
> relevant fab.  Initially I am looking for a smalll number of wafers
> (5-10) to prove a concept.
>
> thanks,
>
> Dr. Helen Berney
> National Microelectronics Research Centre, LeeMaltings,Cork, Ireland.
> Tel +353-21-4904010 Fax +353-21-4270271 Email hberney@nmrc.ie
>
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