Are you using aqua regia to etch Pt? If so, we use 1813 resist with the
following aqua regia recipe: 8 H2O : 7 HCl : 1 HNO3 @ 85C. To pattern a
significant fraction of a 4" wafer, the volumes we use are 300 ml H2O:
260 ml HCl : 37.5 HNO3 and the etching is done in a pyrex 8"x 8" pan.
NOTE: Using the above volumes we can only etch one (1) 4" wafer. After
that the resist gets attacked within the first 20 sec.!

-Mike

>>> hzeng@ece.uic.edu 02/22/02 10:04AM >>>
Hello All,

Right now I'm trying to etch platinum. I checked in the THIN FILM
PROCESSES
talking about the echant, it doesn't give a proper material for mask.
Can
you please tell me by which mask material should I use in the Pt
etching
process?

Thanks a lot,
Hongjun Zeng

Microfabrication Applications Laboratory (MAL)
University of Illinois at Chicago
ERF Building, 842 W. Taylor Street
Chicago, IL 60607-7022
Room 3014 ERF
Tel.: 312-413-5889, Fax: 312-996-6465
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