Though I don't have experience etching fused silica, perhaps the techniques I
have used to etch Pyrex would be applicable.

Since  photoresist doesn't adhere well to Pyrex, I use a chrome layer on the
Pyrex as an adhesion layer/etch mask.

If an isotropic profile is acceptable, buffered oxide etch (1.7 microns/hr for
Pyrex), or HF solution should work.  If an anisotropic profile is desired, a
fluorine based RIE process, such as SF6/O2 should suffice (5 microns/hr for
Pyrex).

Roger Shile

>>> edward.chan@tufts.edu 05/10/02 12:07PM >>>
Hi all,

I was wondering if anyone could suggest the "best" way of creating a swimming
pool like structure about 20 microns deep in a piece of fused silica.
Basically, I need a trench with a known depth for fluid film thickness
calibrations.  Any ideas or preferred companies for this?

Thanks,
Edward
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