Chris, This is a very interesting question. Maybe you can provide the average shape and dimension of your recessed structures to help people understand your situation better. I would try letting photoresist cover the wafer completely (instead of 1/3 or 1 /4 of the wafer surface) before spining, and perhaps spining at a slower rate initially. I am curious about whether you have tried these. Regards, Chang Liu MEMS Critical Research Initiative University of Illinois, Urbana-Champaign 217-333-4051(o) http://www.cco.caltech.edu/~changliu