durusmail: mems-talk: etching Si-N, but not Al2O3
etching Si-N, but not Al2O3
etching Si-N, but not Al2O3
BobHendu@aol.com
2002-10-22
A standard Fluorine plasma in an rie system should accomplish what you are
looking for without removal of Al2O3. If you want further information give me
a call at 480-558-1156

Bob Henderson


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