Patrick,

Chlorine RIE does an excellent job of etching single crystal silicon and
uniformly doped polysilicon using silicon dioxide as a mask.  The selectivity is
at least 100:1 with perfect vertical sidewalls.

Bob Cole
The Aerospace Corporation





                      Patrick Carlberg
                                      cc:
                      Sent by:                   Subject: [mems-talk] Etching Si
with SiO2 as mask
                      mems-talk-bounces@
                      memsnet.org


                      11/25/02 06:48 AM
                      Please respond to
                      General MEMS
                      discussion






Dear all

I am interesseted in etching Si with SiO2 as an etch mask. Does anyone
know of a dry or wet etch that can be used?

All comments are highly apriciated

Patrick





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