-----Original Message-----
> From: Prem Pal [mailto:prem_iitd@rediffmail.com]
> Sent: Monday, December 16, 2002 7:34 AM
> To: mems-talk@memsnet.org
> Subject: [mems-talk] Metal mask for anisotropic etching in EDP, KOH
> Dear all
> what all metals can be used as a mask during silicon ething in EDP
> or KOH. any type of suggetion would be highly appreciated.

We have found that the following metals do not etch in 33% KOH at 80 C:
Au (with Cr adhesion layer)
Pt (with Cr adhesion layer)
Ni (with Cr adhesion layer)
Mo (no adhsion layer)
        --Kirt Williams Agilent Technologies