I gave you a experiment performance :CF4 15sccm O2 25sccm Pr:250W Pressure 10mT
Bias 400V rate360nm/min

I have another problems about BCB .Do you know the use when the bcb use in
semiconductor eg. III-V
---- Original Message -----
From: "haixinzhu" 
To: 
Sent: Thursday, February 06, 2003 5:46 AM
Subject: [mems-talk] Etching rate for BCB


> Dear all,
>
> I am trying to etch BCB layer using 1:4 CF4/O2, anyone know the etching rate?
>
> Thanks.
>
> Michael
>