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mems-talk
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Re: PECVD nitride/oxide layer as a mask for KOH silicon etching (Swiss Chen) (Yuanfang Gao)
paper presented in Solid-State Sensor and Actuator Workshop, June 1996 (Liviu NICU)
Polymer as mechanical structure. (Dr. Helge Bohlmann)
wireless accelerometer (Harry Tibbals)
Fluorescense-SU-8 (bille@npphotonics (Bill Eaton))
TEOS Vendor (Robert C Cole)
XeF2 etching (Hsin (Alex) Chang)
RE: amorphours silicon's mechnical characteristics. (li gang) (J. Gaspar) (Joao Gaspar)
thick aluminum film on wafers (tdv218@hecky.it.northwestern.edu)
Nafion actuator microfabrication (ZHOU WEN LI)