Hi, Removal PG (heat and stir, >6 hours) works very well to remove SU8. Sincerely, Zhiwei Zou Graduate Research Assistant Microsystems and BioMEMS Laboratory Center for BioMEMS and NanoBiosystems Dept. of Electrical and Computer Engineering and Computer Science 919 Rhodes Hall, Cincinnati, Ohio 45221-0030 University of Cincinnati (Phone): 513-556-0852 (Fax): 513-556-7326 (E-mail): zouz@ececs.uc.edu (Website): http://www.ececs.uc.edu/~zouz ==================================================== -----Original Message----- From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org] On Behalf Of ZICKAR Micha?l Sent: Wednesday, July 26, 2006 7:35 AM To: General MEMS discussion Subject: RE: [mems-talk] SU 8 removal Hi, If you have large areas of SU-8 a thermal shock - heat the wafer and cool in water - might do it. Otherwise think about a SU-8 which has a bad adhesion to your substrate (e.g. HMDS priming prior to spinning or sacrificial photoresist). As already mentioned, etching SU-8 will be difficult.