Hi all, I have been patterning structures into PMMA using an Electron beam lithography system. I was wondering if anyone had any advice on capturing an image of the cross section for the patterned structure (post-development) using an SEM. My attempts so far have failed. Cleaving sidewards across a pattern seems to destroy the pattern on the cleaved sample. I have also tried sputter coating the to ensure little damage to the resist when viewing under SEM. If anyone has any advice or know any "tricks" for captuign cross-sectional images, I would be grateful! Cheers, Jeff Kettle