I've found that freezing the sample in LN2 before cleaving helps.  It's
still not perfect and PMMA doesn't like to break cleanly but it breaks
more than tears when I do this.



-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Jeff Kettle
Sent: Wednesday, July 26, 2006 9:42 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] Cross section imaging of EBL patterns

Hi all,

  I have been patterning structures into PMMA using an Electron beam
lithography system. I was wondering if anyone had any advice on
capturing an image of the cross section for the patterned structure
(post-development) using an SEM.

  My attempts so far have failed. Cleaving sidewards across a pattern
seems to destroy the pattern on the cleaved sample. I have also tried
sputter coating the to ensure little damage to the resist when viewing
under SEM. If anyone has any advice or know any "tricks" for captuign
cross-sectional images, I would be grateful! Cheers, Jeff Kettle
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