Hi CJ, I think most people use phosphoric acid for SiN etching, BOE works well for PECVD SiN but not thermal nitride. Regards, Scott ----- Original Message ----- From: "??? Chun-Jung Su"To: Sent: Saturday, October 28, 2006 12:53 PM Subject: [mems-talk] Wet etching SiN with photoresist > Dear all, > > I am trying to etch 1000A-thick SiN with photoresist. I have used B.O.E. > to > etch the SiN formed by our LPCVD system, but the etching rate is quite > low, > i.e. 12 A/ min. Is there any other chemical solution to accomplish this > job?