Hi All !

For my process, I would like to know if there is an "easy" way to get
a thick (300microns > t > 30 microns) layer of bare aluminum on a
silicon wafer ?
Evaporation and Sputtering are not suitable for this...

Thank you very much for you help

Jacques FATTACCIOLI
IIS - University of Tokyo
jacques@iis.u-tokyo.ac.jp