A very dilute mixture of fluorine from CF4 or CHF3 and nitrogen or oxygen should do the trick. Keep the overall ratio of CF4 to less than 5% of the total gas flow and use a pressure of around 250 mtorr for best results. Bob Henderson ----- Original Message ----- From: "Chin-Jen Chiang"To: Sent: Wednesday, January 23, 2008 6:43 PM Subject: [mems-talk] how to get rid of photoresist residure > Hi, > > I am trying to use PRS-3000 and NMP at ~80C to get rid of photoresist residure but either way dose not work. Given the concern of my device structure, I can not use Pirahna or RIE O2 descuum. Can anyone suggest any other approach?