If There are not Al or Ti alloys on the sample, you can use pure developer
(AZ400 K or AZ 324). Approximate 10 secs you will obtain clean surface. But
be carefull not to damage alloy cantacts..

See you...

Tolga YELBOGA
Project Engineer
Nanotechnology Researh Center
Bilkent University
Bilkent, Ankara 06800 TURKEY
Voice: 90-312-290-1020
www.nanotr.bilkent.edu.tr
-----Original Message-----
From: Chin-Jen Chiang [mailto:chinjen_chiang@yahoo.com.tw]
Sent: Friday, January 25, 2008 12:42 AM
To: General MEMS discussion
Subject: RE: [mems-talk] how to get rid of photoresist residure

Hi Bill,

  Thanks for your response.

  My device has very sharp Si field emitter tips with ~150A radius. Using
RIE descum with O2 gas might damage the Si tips due to ion or radical
bombardment. Do you have any comment about this?
  Thanks.

  Lawrence