What is your device concern?  Modern plasma cleaners have electron free
plasma that can safely and gently etch organics with no ESD and minimal
change if temperature.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

www.yieldengineering.com

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Chin-Jen Chiang
Sent: Wednesday, January 23, 2008 5:44 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] how to get rid of photoresist residure

Hi,

  I am trying to use PRS-3000 and NMP at ~80C to get rid of photoresist
residure but either way dose not work. Given the concern of my device
structure, I can not use Pirahna or RIE O2 descuum. Can anyone suggest
any other approach?